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Electron diffraction and high-resolution transmission microscopy studies of nanostructured Si thin films deposited by radiofrequency dusty plasmas

机译：射频尘埃等离子体沉积的纳米结构硅薄膜的电子衍射和高分辨率透射显微镜研究

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Viera, Gregorio; Huet, Stéphanie; Mikikian, Maxime; Boufendi, Laifa;
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年度 2002
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机译：射频尘埃等离子体沉积的纳米结构硅薄膜的电子衍射和高分辨率透射显微镜研究
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3. Synchrotron white beam X-ray topography, transmission electron microscopy and high-resolution X-ray diffraction studies of defects and strain relaxation processes in wide band gap semiconductor crystals and thin films [J] . Dudley M, Bai J, Huang X, Materials science in semiconductor processing . 2006,第1a3期

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Electron diffraction and high-resolution transmission microscopy studies of nanostructured Si thin films deposited by radiofrequency dusty plasmas

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